KS Instrument Equipment

​​​​​​​​​​​​​​​​​​​​​One-stop Lab Equipment

Dual-target magnetron sputtering coating instrument

Model number  :KS-MSC-180S-DC/RF

 

​​​​​​​Application :The dual-target magnetron sputtering coating instrument can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, polytetrafluoroethylene films, etc.

 

 

 

 

 

 

Plasma sputtering coating instrument i

Model number : KS-PSC-180Q-DC   

 

 Application scope: Can be used for metal sputtering coating, especially suitable for coating of metals such as gold, silver and copper.题-双击进行编辑

​​​​​​  Introduction : The laboratory plasma cleaning machine ionizes working gases such as argon, oxygen, and nitrogen through high-frequency electric fields or microwaves to form plasma. The high-energy particles in the plasma collide with the surface of the object to be cleaned, causing physical bombardment, which removes the contaminants on the surface. At the same time, the plasma also reacts chemically with the surface contaminants, generating volatile substances, thereby achieving surface cleaning.

5L plasma cleaner 500W/1000W

Rotary Uniform Glue Machine Features Introduction

Features Introduction
The rotating glue machine is a measuring instrument used in the basic subject field of engineering and technical science. It was opened on December 12, 2014.

technical indicators

rotating glue homogenizer can automatically and quantitatively drop photoresist (the supported annual photoresist is 10cp-500cp), or it can manually drop photoresist in experiments. The glue leveling time can be adjusted and continuous in the range of 0.1s to 999s; Satisfy the spin coating of samples with diameters ranging from 3mm to 150mm; The stable rotation speed range can be 50 r/min to 8000 r/min, and the acceleration range is 50 rpm/s to 4000 rpm/s; the uniformity of the film thickness was 2%(Resist AZ5214E,1um).

Main Functions

rotating uniform glue machine is often used in film production in various sol-gel experiments. The viscosity coefficient between the substrate and the spin-coated glue solution is different, and the thickness will be different. At the same time, the time and speed of spin coating will also have different effects on the thickness.

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