KS Instrument Equipment

​​​​​​​​​​​​​​​​​​​​​One-stop Lab Equipment

Dual-target magnetron sputtering coating instrument

Model number  :KS-MSC-180S-DC/RF

 

​​​​​​​Application :The dual-target magnetron sputtering coating instrument can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, polytetrafluoroethylene films, etc.

 

 

 

 

 

 

Plasma sputtering coating instrument i

Model number : KS-PSC-180Q-DC   

 

 Application scope: Can be used for metal sputtering coating, especially suitable for coating of metals such as gold, silver and copper.题-双击进行编辑

​​​​​​  Introduction : The laboratory plasma cleaning machine ionizes working gases such as argon, oxygen, and nitrogen through high-frequency electric fields or microwaves to form plasma. The high-energy particles in the plasma collide with the surface of the object to be cleaned, causing physical bombardment, which removes the contaminants on the surface. At the same time, the plasma also reacts chemically with the surface contaminants, generating volatile substances, thereby achieving surface cleaning.

5L plasma cleaner 500W/1000W

Vacuum Muffle Furnace

Product Features

1. The ultimate vacuum degree in the furnace can reach 10Pa (double-stage rotary vane vacuum pump) or 7x10-2Pa (double-stage rotary vane vacuum pump diffusion pump) to ensure the high efficiency and stability of the material processing process.

2. The maximum working temperature can be 1200 ℃ or 1700 ℃.

3, designed with a dedicated inlet and outlet, can be used for vacuum, can also be filled with inert gas, to achieve a variety of processing environment.

4, the use of pneumatic vacuum valve, convenient operation, improve the overall efficiency of the equipment.

5. The furnace is made of high-quality alumina ceramic fiber material, which is heated with resistance wire or silicon molybdenum rod to ensure excellent heating effect and greatly reduce the operating cost of the equipment.

6. Double-layer water cooling design can effectively control the surface temperature of the furnace shell to ensure safe operation. The surface temperature of the furnace shell is ≤ 50 ℃.

7. The furnace body shell is made of high-strength carbon steel, and the external electrostatic spray treatment is not only beautiful, but also enhances the durability of the equipment.

8, equipped with high-definition touch screen man-machine interface, built-in advanced operating system, intuitive operation, easy to use.

9. The programmable temperature control instrument adopts PID adjustment method to realize accurate temperature control.

Name Vacuum Muffle Furnace (Ceramic Fiber Furnace)
Product Model KS-MV
Furnace chamber size 100mm wide × 100mm high × 100mm deep ~ 800mm wide * 800mm high * 1200mm deep (size can be customized)
Maximum temperature 1200 ℃, 1700 ℃
Working temperature 1100 ℃, 1600 ℃
Heating speed 0-20 ℃(recommended10℃/min)
Temperature uniformity ±5 ℃
Heating element resistance wire, silicon molybdenum rod
Thermocouple Type K, Type B
Cooling method water cooling
Atmosphere . Do not allow reducing gas
Vacuum degree The ultimate vacuum degree can reach 10Pa (two-stage rotary vane vacuum pump) or 7x10-2Pa (two-stage rotary vane vacuum pump diffusion pump)
Voltage AC220V/380,50/60Hz
Customized services can be customized (consult customer service)
Vacuum Muffle Furnace an efficient and economical vacuum processing equipment. It has won wide recognition in the market with its excellent cost performance. The furnace body is well designed, the operation is simple and intuitive, the vacuum effect is excellent, and the temperature distribution is uniform, which provides an ideal environment for the processing of various materials. Especially suitable for ceramic materials, ceramic metal composite materials, refractory metals and alloy material
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