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Dual-target magnetron sputtering coating instrument

Model number :KS-MSC-180S-DC/RF

Application :The dual-target magnetron sputtering coating instrument can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, polytetrafluoroethylene films, etc.

Plasma sputtering coating instrument i

Model number : KS-PSC-180Q-DC

Application scope: Can be used for metal sputtering coating, especially suitable for coating of metals such as gold, silver and copper.题-双击进行编辑

Introduction : The laboratory plasma cleaning machine ionizes working gases such as argon, oxygen, and nitrogen through high-frequency electric fields or microwaves to form plasma. The high-energy particles in the plasma collide with the surface of the object to be cleaned, causing physical bombardment, which removes the contaminants on the surface. At the same time, the plasma also reacts chemically with the surface contaminants, generating volatile substances, thereby achieving surface cleaning.

5L plasma cleaner 500W/1000W

Small Single Target Magnetron Sputtering Coater

Technical Parameters:

This set of configuration uses a quartz vacuum chamber, and the coating process is omnidirectionally visible, which is convenient for experimental observation and recording. The chamber design is easy to open and clean, and is very suitable for laboratory use. At the same time, the equipment is equipped with a rotating heating sample table, which can effectively improve the uniformity of the film and the quality of the film. The whole machine adopts a modular design, with simple operation logic and intuitive operation interface, which is easy to use.

Small Single Target Magnetron Sputtering Coating Instrument
Product Model	KS-MST180
Sample table	Dimensions	φ100mm
Sample table	Vibration frequency	20 Hz-20000Hz
Magnetron target gun	Equipped with a two-inch magnetron target, target size: diameter 50mm, thickness ≦ 3mm
Vacuum chamber	Cavity Size	φ180mm X 200mm
	Bbservation window	Omni-directional transparency
	Cavity Material	high purity quartz
	Opening mode	upper cover removable type
Vacuum system	Front pump	low noise bipolar rotary vane pump
	Molecular pump	low noise high pumping speed turbo molecular pump
	Vacuum measurement	compound vacuum gauge, range: 10-5~105Pa
	Air extraction interface	KF40
	Exhaust interface	KF16
	System vacuum	1.0 × 10-4Pa
	Power supply	AC 220V 50/60Hz
	Pumping rate	molecular pump pumping speed 600L/s, pre-pump pumping speed 1.1L/s
Power Configuration	Power supplies	One set of DC power supply
Power Configuration	Output power	300W
Other parameters	Supply voltage	AC220V,50Hz
	Overall machine power	2kW
	Overall size	550mm X 350mm X1200mm
Customizable

Product Description: This equipment is a desktop-type quartz cavity single-target magnetron sputtering coating instrument, which can be used for the preparation of metal thin films. It has applications in the fields of electronics, optics, special ceramic preparation, etc., and can also be used for laboratory SEM sample preparation.

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