Electron Beam Evaporation Coater
Technical parameters:
| Product Name | Electron Beam Evaporation Coating instrument | |
| Sample table | Dimensions | <150mm, sample table can be rotated |
| Adjustable temperature | ≦ 500 ℃ | |
| Electron gun | New electron gun, 6-hole crucible | |
| Heating lamp | 4 halogen heating lamps for degassing, 1 neon lamp for illumination | |
| Vacuum chamber | Cavity Size | Φ500 * H500mm |
| Observation window | diameter & phi;100mm | |
| Cavity Material | 304 stainless steel | |
| Opening mode | Front opening type | |
| Film thickness measurement | Monitored by SQM160 film thickness gauge, and the unevenness of coating thickness is less than 6%. | |
| Vacuum system | Front pump | bipolar rotary vane pump, gas pumping speed 1.1L/S |
| Secondary pump | turbo molecular pump, gas pumping speed 600L/S | |
| Vacuum measurement | compound vacuum gauge (ionization gauge + resistance gauge) | |
| System vacuum | 5 × 10-5Pa | |
| Water cooling system | Water pressure <2.5barwater pressure monitoring | |
| Heating lamp | 4 halogen heating lamps for degassing, 1 neon lamp for illumination | |
| Electrode Interface | with 2-way metal evaporation electrode interface | |
| Control system | CYKY self-developed professional controller | |
| Other parameters | Power supply | AC380V,50Hz |
| Overall size | 1000mm × 800mm × 1500mm | |
| Overall power | 20KW | |
| Overall weight | 350kg | |
Product Introduction: This equipment is mainly used for the preparation of various conductive films, semiconductor films, ferroelectric films, optical films, micro-nano devices, pre-treatment of electron microscope samples, etc., especially for evaporation of various refractory metal materials. Not only can be used for glass, silicon and other hard substrates, can also be used for PDMS, PTFE, PI and other flexible substrate coating.
