KS Instrument Equipment

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Dual-target magnetron sputtering coating instrument

Model number  :KS-MSC-180S-DC/RF

 

​​​​​​​Application :The dual-target magnetron sputtering coating instrument can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, polytetrafluoroethylene films, etc.

 

 

 

 

 

 

Plasma sputtering coating instrument i

Model number : KS-PSC-180Q-DC   

 

 Application scope: Can be used for metal sputtering coating, especially suitable for coating of metals such as gold, silver and copper.题-双击进行编辑

​​​​​​  Introduction : The laboratory plasma cleaning machine ionizes working gases such as argon, oxygen, and nitrogen through high-frequency electric fields or microwaves to form plasma. The high-energy particles in the plasma collide with the surface of the object to be cleaned, causing physical bombardment, which removes the contaminants on the surface. At the same time, the plasma also reacts chemically with the surface contaminants, generating volatile substances, thereby achieving surface cleaning.

5L plasma cleaner 500W/1000W

Plasma Cleaning Machine 300W

Details:

Plasma cleaning machine is a small, non-destructive cleaning equipment. The plasma cleaning machine uses low-pressure excitation plasma as the cleaning medium, which effectively avoids the secondary pollution caused by the liquid cleaning medium to the object to be cleaned. The instrument is equipped with a mechanical vacuum pump, which can also be pumped away by the vacuum pump while maintaining the vacuum degree of the cavity. Therefore, the organic pollutants can be thoroughly cleaned by cleaning in a short time.

plasma cleaning machine (plasma cleaner), is a new high-tech technology, the use of plasma to achieve regular cleaning methods can not achieve the effect. Plasma is a state of matter, also known as the fourth state of matter, and does not belong to the common three states of solid, liquid and gas. Sufficient energy is applied to the gas to dissociate it into a plasma state. The "active" components of the plasma include: ions, electrons, atoms, active radicals, excited species (metastable states), photons, etc. Plasma cleaning machine is through the use of the nature of these active components to deal with the sample surface, so as to achieve the purpose of cleaning, coating and so on.

In addition to the cleaning function of this small plasma cleaning machine, the performance of certain materials can be changed according to the needs under certain conditions. During the cleaning process, the glow discharge of the small plasma cleaning machine can strengthen the adhesion of these materials Sex, compatibility and wettability.

This plasma cleaning machine is suitable for laboratory and small production. The 13.56Mhz RF power supply can be used to match the plasma of various commonly used gases. The power of the RF power supply ranges from 100W to 1000W. There are many common specifications available for selection, which can meet the diverse needs of users.

 

Technical Parameters:

Main Components Indicator Name parameter indicators
Cleaning bin body Cleaning chamber material 304 stainless steel
Cleaning chamber size 295*350*340
RF power supply Power Supply Characteristics The power supply is an all-solid-state RF power supply, and adopts a high-stability and high-reliability power amplifier module and a DC module, which effectively guarantees the RF power output of the power supply. The use of high-quality electronic components, so that the reliability of the product can be guaranteed.
Power Advantages can run normally for a long time
simple and flexible operation
High power efficiency, less heat
has perfect reflected power protection function
RF Power 0~300W continuously adjustable
Signal frequency 13.56MHz ±0.005%
Reflected power ≤ 200W
Power stability ± 0.1%
RF Connector N type head
Overall efficiency ≥ 75%
Harmonic component ≤-50 dBc
Cooling method forced air cooling
Gas measurement Measuring parts float flowmeter
Gas channel two channels
A channel range 10 to 100ml
B Channel Range 16 to 160ml
Vacuum acquisition Vacuum measurement digital vacuum gauge (resistance gauge)
Vacuum extraction bipolar rotary vane pump
Motor speed 50Hz: 1440;60Hz: 1720
Pumping rate 50Hz: 1.1L/s;60Hz: 1.3L/s
Vacuum range 1Pa ~ 100000Pa
Ultimate vacuum 1Pa
Motor noise ≤ 56dB
Pipe Interface air inlet: KF16; air outlet KF16.
Connecting pipe KF16 vacuum bellows
Vacuum valve solenoid valve
Motor power 400W
Others Power supply AC220V 50/60Hz
Overall power 550W/600W
Use temperature -10 ℃ - 40 ℃
Working vacuum ≤ 40Pa
Overall size 700mm × 750mm × 650mm
Overall weight 125kg
Simple Introduction:
Plasma cleaning machine is a small, non-destructive cleaning equipment. The plasma cleaning machine uses low-pressure excitation plasma as the cleaning medium, which effectively avoids the secondary pollution caused by the liquid cleaning medium to the object to be cleaned.
等离子清洗机
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