KS Instrument Equipment

E-mail: Amizhang@keshuoins.cn

 

One-stop Lab Equipment

PLD pulse laser coating instrument

System composition:
Mainly composed of sputtering vacuum chamber, rotating target table, anti-oxidation substrate heating table, working gas path, exhaust system, installation machine, vacuum measurement and electronic control system.
Technical indicators:

Ultimate vacuum degree: ≤6.7×10 Pa

Recovering vacuum time: ≤20min from 1×10 Pa to 5×10 Pa

System leakage rate: 6. 7×10-7Pa.L/S;

Vacuum chamber: Ф300 spherical vacuum chamber,

Substrate size: 4″ can be placed to realize the target position scanning, etc. The substrate heating can be rotated continuously, the speed is 5-60 rpm, and the distance between the substrate and the evaporation source is 300-350mm adjustable.

Two-dimensional scanning mechanical platform, performs two-degree-of-freedom scanning, and the control content mainly includes target conversion, target rotation, sample rotation, sample temperature control, laser beam scanning, mass flow controller 1 channel

Baking temperature: 150℃ digital display automatic thermocouple temperature control (high temperature furnace plate, digital display automatic thermocouple temperature control can be heated to 800℃)

Product Display

Main uses:
Used to prepare superconducting films, semiconductor films, ferroelectric films, superhard films, etc. Suitable for scientific research and small-batch preparation of thin film materials in colleges and universities and scientific research institutes.
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