KS Instrument Equipment

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Dual-target magnetron sputtering coating instrument

Model number  :KS-MSC-180S-DC/RF

 

​​​​​​​Application :The dual-target magnetron sputtering coating instrument can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, polytetrafluoroethylene films, etc.

 

 

 

 

 

 

Plasma sputtering coating instrument i

Model number : KS-PSC-180Q-DC   

 

 Application scope: Can be used for metal sputtering coating, especially suitable for coating of metals such as gold, silver and copper.题-双击进行编辑

​​​​​​  Introduction : The laboratory plasma cleaning machine ionizes working gases such as argon, oxygen, and nitrogen through high-frequency electric fields or microwaves to form plasma. The high-energy particles in the plasma collide with the surface of the object to be cleaned, causing physical bombardment, which removes the contaminants on the surface. At the same time, the plasma also reacts chemically with the surface contaminants, generating volatile substances, thereby achieving surface cleaning.

5L plasma cleaner 500W/1000W

Three-target automatic magnetron sputtering coating instrument

1. Sputtering chamber vacuum limit: ≤6.6×10-6 Pa;
2. System vacuum leak detection rate: ≤5.0×10-7Pa.l/S;
3. The system starts to evacuate from the atmosphere: the sputtering chamber can reach 6.6×10-4 Pa in 30 minutes;
4. The vacuum degree of the system after stopping the pump and shutting down for 12 hours: ≤5Pa;
5. 1 set of sputtering vacuum chamber, vertical top opening structure, size not less than Ф300mm×300mm, all stainless steel structure, argon arc welding, electrochemical polishing of the surface, containing anti-fouling lining, can be baked to 100~150℃, the interface is sealed with metal gaskets or fluororubber rings, and there is a lighting system in the cavity;
6. 3 sets of magnetron sputtering systems, The sputtering chamber is equipped with 3 sets of 50mm high-performance permanent magnet confocal magnetron sputtering targets (the sputtering target angle is adjustable). Each target can work independently/sequentially/together. The magnetron targets are compatible with RF, DC, and MF, and can sputter magnetic materials. The distance between the magnetron targets and the substrate is adjustable. It is equipped with 3 sets of imported SMC rotary pneumatic control baffle assemblies; 2 500w DC power supplies (not less than 500W) and 1 fully automatic matching RF power supply (not less than 500W); 3 test targets are provided. Coating unevenness ≤5%;
7. 1 set of rotating substrate stage, the sample stage can hold 1 sample of not less than 100mm, with continuous rotation function, and the rotation is continuously adjustable from 0 to 30 rpm. Substrate heating temperature: room temperature - 500 ° C continuously adjustable, controlled by thermocouple closed-loop feedback, heating power supply equipped with temperature control meter, temperature control mode is PID automatic temperature control and digital display;
8. Observation window and flange interface components 1 set;
9. Working gas circuit 1 set, including: 100SCCM, 20SCCM mass flow controller, CF16 stop valve, pipeline, joints, etc., a total of 2 lines; DN16 inflation valve, pipeline, joints, etc. 2 lines;
10. Vacuum unit and valves, pipelines 1 set, including 1 imported compound molecular pump and variable frequency control power supply (680L/s, German Hipace700 molecular pump); 1 mechanical pump (4L/S) , 1 DN40 pneumatic stop valve, 1 set of bypass pipeline between mechanical pump and vacuum chamber, 1 CC150 pneumatic gate valve (used to isolate compound molecular pump from vacuum chamber), 1 throttle valve, 1 DN40 bypass air valve, 1 differential pressure inflation valve; pipelines are made of stainless steel tees and bellows;
11. 1 set of machine frame assembly, welded from high-quality square steel profiles, the surface of the quick-release enclosure is sprayed with plastic, the surface of the machine is decorated with stainless steel skin, and there are four casters, which can be fixed and moved;
12. 1 set of vacuum measurement system, the sputtering chamber uses imported INFICON compound meter for measurement.                13. It has the ability to alarm and implement corresponding protection measures for abnormal conditions such as water shortage, overcurrent, overpressure, and circuit breakage of pumps, targets, electrodes, etc.; a complete logic program interlocking protection system.;                                                                                                                                                                                                              14. The system adopts PLC + industrial computer + touch screen full-automatic control mode, which can automatically pump air and set programs, display and record vacuum degree and heating temperature in real time, display DC power supply and RF power parameters, display MFC setting control, display duty status, sample speed, etc;                                                                                                                15. Equipped with a circulating water machine, a silent air compressor, a set of special tools (including tool box), and a set of spare parts.

It is used for the preparation of new thin film materials such as nano-scale single-layer and multi-layer functional films, hard films, metal films, semiconductor films, dielectric films, etc. It can be widely used in the scientific research and small-batch preparation of thin film materials in colleges and universities and scientific research institutes.
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