Dual-target magnetron sputtering coating instrument

Model number  :KS-MSC-180S-DC/RF

​​​​​​​Application :The dual-target magnetron sputtering coating instrument can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, polytetrafluoroethylene films, etc.

Plasma sputtering coating instrument i

Model number : KS-PSC-180Q-DC   

 Application scope: Can be used for metal sputtering coating, especially suitable for coating of metals such as gold, silver and copper.题-双击进行编辑

​​​​​​  Introduction : The laboratory plasma cleaning machine ionizes working gases such as argon, oxygen, and nitrogen through high-frequency electric fields or microwaves to form plasma. The high-energy particles in the plasma collide with the surface of the object to be cleaned, causing physical bombardment, which removes the contaminants on the surface. At the same time, the plasma also reacts chemically with the surface contaminants, generating volatile substances, thereby achieving surface cleaning.

5L plasma cleaner 500W/1000W